Self-assembly technique could lead to long-awaited, simple method for making smaller microchip patterns

A new interface control technique for block co-polymer self-assembly could provide long-sought method for making even tinier patterns on microchips with lines just 9 nanometers wide.

from Engineering and Construction News – ScienceDaily https://www.sciencedaily.com/releases/2017/03/170327131250.htm

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